◼PRODUCT DESCRIPTION
As the semiconductor industry develops, the process size of wafer manufacturing continues to shrink to 2nm or even lower. High-precision, responsive and repeatable gas flow control methods are crucial in the wafer processing process.
With the emergence of small flow control, short process time and continuous plasma process, high-end MFC is striving to meet the accuracy, stability time and repeatability requirements required to ensure high yield and match the reaction chamber.
Pioneer Yuanchuang Fluid's MFC paves the way for the future of gas flow control. The product combines a high-precision MFM system with control valve technology and is patented. As a result, Pioneer Yuanchuang Fluid's MFC has achieved an order of magnitude improvement in key flow indicators, leading the existing MFC technology and can be applied to advanced wafer manufacturing processes.
◼PRODUCT FEATURES
The MFC of Pioneer Fluid has a patented dual-valve control design, which supports extremely high-precision and extremely wide-range flow measurement. Our MFC uses pressure sensors and position sensors to automatically monitor, measure and control gas flow more accurately and quickly. Insensitive to pressure and temperature
The product is designed with a unique position control valve. This design makes the high-flow MFC unaffected by upstream and downstream pressure or temperature changes. The high-precision MEMS sensor monitors the pressure and temperature of the measured gas once per millisecond. The MFC control system will directly control the valve to move to the correct position without considering the temperature conversion coefficient.
◼EXTREMELY SHORT RESPONSE TIME
The medium flow MFC has the shortest stabilization time among similar flow controller products: the response time after changing the gas flow setting is less than 300 milliseconds
(See the figure below)
0 - 20 slm Gas injection time/Turn on Time |
0 - 10 slm Gas injection time/Turn on Time | 
0 - 5 slm Gas injection time/Turn on Time |
Mass flow controller model | P110 |
performance | Range | 100 - 50000 sccm |
Flow accuracy | ±1% accuracy at set point (10% - 100% F.S.): 0.5 slm - 5 slm, 2.0 slm − 20 slm, 5.0 slm - 50 slm ±0.25% full scale accuracy (2% - 10% F.S.): 0.1 slm - 0.5 slm, 0.4 slm - 2.0 slm,1.0 slm - 5.0 slm |
Repeatability | Accuracy at set point: ±0.25% (10%-100% F.S.) |
Response time | ≤300 ms (10% - 100% F.S.); ≤ 500 ms (2% - 10% F.S.)* |
Sealing | ≤ 1E-9 atm·cc/sec (He) |
Leak rate | <2.5 sccm |
Working conditions | Upstream pressure | Standard: 276 - 448kPaG (40 - 65 psig) |
Downstream pressure | Vacuum to 101 kPa (0 − 760 Torr) |
Compressive strength | 2.07 MPaG (300 psig) |
Design pressure (burst pressure) | 3.10 MPaG (450 psig) |
Working temperature | 15−50°C |
Material | Gas path surface | 316 SS, Inconel 625 that meet Semi F20 standards |
Surface treatment | Average Ra value is 5 µin |
seals | PCTFE |
Communication circuit | DeviceNet | 11 - 24 VDC, 5 W |
Analog and RS-485 | ±15 VDC, 150 mA |
Inrush current | <200 mA |
* The setpoint retention time during analog control is 60 milliseconds. This retention time does not include the device's response time, as stated in this manual. When operating using analog control, the MFC setpoint sensitivity is a minimum of ±50 mV, but flow accuracy is not affected. The measured setpoint and the corresponding flow feedback may differ from the desired setpoint by this amount (±50 mV). To ensure consistency between device input and controller output, analog calibration is recommended. |
gas | Gas No. | Bin 10: 5L | Bin 20: 20L | Bin 30: 50 L | Input Gas Pressure Range (psig) | Maximum downstream gas pressure
(Torr) |
Minimum Flow | Full scale setting | Minimum Flow | Full scale setting | Minimum Flow | Full scale setting |
Min | Max | Min | Max |
Min |
Max |
N2 | 13 | 100 | 2001 | 5000 | 400 | 5001 | 20000 | 1000 | 20001 | 50000 | 40 - 65 | 760 |
Ar | 4 | 100 | 2001 | 5000 | 400 | 5001 | 20000 | 1000 | 20001 | 40000 | 40 - 65 | 760 |
CO2 | 25 | 100 | 2001 | 5000 | 400 | 5001 | 20000 | 1000 | 20001 | 35000 | 40 - 65 | 760 |
H2 | 7 | 400 | 5001 | 20000 | 1000 | 20001 | 50000 |
- |
- |
- | 40 - 65 | 760 |
He | 1 | 400 | 2001 | 15000 | 1000 | 15001 | 50000 | 2000 | 50001 | 100000 | 40 - 65 | 760 |
O2 | 15 | 100 | 2001 | 5000 | 400 | 5001 | 20000 | 1000 | 20001 | 45000 | 40 - 65 | 760 |
N2O | 27 | 100 | 2001 | 5000 | 400 | 5001 | 20000 | 1000 | 20001 | 35000 | 40 - 65 | 760 |
NF3 | 53 | 100 | 2001 | 2500 | 400 | 2501 | 10000 | 1000 | 10001 | 25000 | 40 - 65 | 760 |
NH3 | 29 | 120 | 2001 | 6000 | 500 | 6001 | 25000 |
- |
- |
- | 40 - 65 | 760 |
4% H2 in N2 | 607 | 100 | 2001 | 5000 | 400 | 5001 | 20000 | 1000 | 20001 | 50000 | 40 - 65 | 760 |
5% B2H6 in N2 | 654 | 100 | 2001 | 5000 | 400 | 5001 | 20000 | 1000 | 20001 | 50000 | 40 - 65 | 760 |
If you are interested in other gases and/or configurations, please contact our sales representatives.
| Code | Definition | Option | Option Description |
| I | Model | P110 | Gas Flow Controller |
| II | Special Application | XX | Standard Application |
| III | Configuration | X | Pre-set Gas Configuration |
| IV | Gas/Standard Bin | XXXX XXXX | Semiconductor Specialty Gas Code & Range |
| V | Pipe Interface & Housing Width | 01 | VCR 1.125" |
| 02 | C-Seal 1.125" |
| 03 | W-Seal 1.125" |
| VI | Valve Status | C | Normally Closed |
| VII | Downstream Pressure Environment | V | Vacuum |
| A | Atmospheric Pressure - This option does not support low-pressure gas delivery, and inlet pressure must be ≥60psia |
| VIII | Communication/Power Interface | DeviceNet SeriesDA~DP
RS-485 SeriesRA~RC
Analog SeriesAA~AL
EtherCATEA | DeviceNet:
- Connector: 5 Pin Micro
- Signal Type: Count/Integer/SCCM/Float
- Baud Rate: 500KB/500 ms
- Mac ID Range: 6~22/7FFFh/603d, etc.
- Startup State: Idle
- I/O State Switching Polling: Executing
RS-485:
- Connector: 9-Pin D/RJ45
- Baud Rate: 115200
- Startup State: NA
- I/O State Switching Polling: NA
Analog:
- Connector: 9-Pin D/20-pin Honda/Card Edge/DB9 to DB15
- Functions: Valve Override/Flow Feedback/Power Supply/Signal Ground
- Startup State: NA
- I/O State Switching Polling: NA
EtherCAT:
- Connector: Comm: RJ45 / Pwr: 5 pin Nano
- Status: INIT
- Signal Delay: NA
- Startup State: NA
- I/O State Switching Polling: NA |
| IX | Special Requirements | XXXX | Customer-Specific Requirement Code |
If you are interested in other gases and/or configurations, please contact our sales representatives.
Standard application model code sample |
I | II | III | IV | V | VI | VII | VIII | IX |
P110 | XX | X | 0004-005L | 01 | C | A | DA | XXXX |
